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玻璃减薄蚀刻液中氟硅酸的选择性脱除方法

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李凯华, 晏乃强, 徐亚玲, 黄源, 瞿赞, 刘志彪. 玻璃减薄蚀刻液中氟硅酸的选择性脱除方法[J]. 环境工程学报, 2014, 8(3): 1079-1085.
引用本文: 李凯华, 晏乃强, 徐亚玲, 黄源, 瞿赞, 刘志彪. 玻璃减薄蚀刻液中氟硅酸的选择性脱除方法[J]. 环境工程学报, 2014, 8(3): 1079-1085.
shu
Li Kaihua, Yan Naiqiang, Xu Yaling, Huang Yuan, Qu Zan, Liu Zhibiao. Method of selective removal of fluosilicic acid from used glass thinning solution[J]. Chinese Journal of Environmental Engineering, 2014, 8(3): 1079-1085.
Citation: Li Kaihua, Yan Naiqiang, Xu Yaling, Huang Yuan, Qu Zan, Liu Zhibiao. Method of selective removal of fluosilicic acid from used glass thinning solution[J]. Chinese Journal of Environmental Engineering, 2014, 8(3): 1079-1085.
shu

玻璃减薄蚀刻液中氟硅酸的选择性脱除方法

  • 1.

    上海交通大学环境科学与工程学院, 上海 200240

  • 2.

    杭州格林达化学公司, 杭州 311200

  • 基金项目:

  • 中图分类号: X703

Method of selective removal of fluosilicic acid from used glass thinning solution

  • 1.

    School of Environmental Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, China

  • 2.

    Hangzhou Greenda Chemical Company Limited, Hangzhou 311200, China

  • Fund Project:

  • 摘要: 光电玻璃减薄蚀刻液中氟硅酸（H2SiF6）的累积，是导致蚀刻液无法连续使用而转化为废液的主要原因。尝试对蚀刻废液中氟硅酸进行选择性脱除工艺，探索刻蚀液循环利用的有效处理方法。鉴于氟硅酸的碱金属盐具有溶解度较低的特点，研究考察了利用钠盐或钾盐为沉淀剂，将废液中的H2SiF6以氟硅酸盐的形式沉淀去除，为实现蚀刻液的循环利用提供可能。结果表明，KCl相比NaCl对H2SiF6处理效果更好，但生成的K2SiF6的结晶颗粒过细，难以自然沉降，过滤效果较差；而Na2SiF6结晶沉降特性较好，且使用NaCl为沉淀剂具有价廉易得等特点，可作为氟硅酸的理想沉淀剂。H2SiF6去除率与碱金属盐H2SiF6摩尔计量比正相关，当摩尔计量比NaCl/H2SiF6=2，H2SiF6含量10%的模拟废液，其H2SiF6去除率可达到90%以上。
    Abstract: The accumulation of fluosilicic acid(H2SIF6)in the thinning process of the electronic grade glass is one of the main reasons to cause the degradation of the thinning solution and the discharge of such kind of waste solution. This study was concentrated on the removal of H2SiF6 from the used glass thinning solution without destroying the basic constituents of the solution. Based on the characteristic of low solubility of the alkali fluosilicate salts,sodium salt and potassium salt were tentatively employed as the precipitation agents to react with H2SiF6 and form Na2SiF6 or K2SiF6 sediment. It was found that using excess sodium or potassium metal salts could remove H2SiF6 efficiently. Compare with K2SiH6, the precipitation property of Na2SiF6 particle is much better and the sodium salt is also inexpensive. Therefore, sodium chloride appeared to be the potential candidature for the removal of H2SiF6 from the used glass thinning solution. The removal efficiency of H2SiF6 was over 90% at 2 for the mole ratio of NaCl/H2SiF6 and 10% of H2SiF6 concentration in the simulate solution.
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出版历程
  • 收稿日期:  2012-10-18
  • 刊出日期:  2014-03-01
李凯华, 晏乃强, 徐亚玲, 黄源, 瞿赞, 刘志彪. 玻璃减薄蚀刻液中氟硅酸的选择性脱除方法[J]. 环境工程学报, 2014, 8(3): 1079-1085.
引用本文: 李凯华, 晏乃强, 徐亚玲, 黄源, 瞿赞, 刘志彪. 玻璃减薄蚀刻液中氟硅酸的选择性脱除方法[J]. 环境工程学报, 2014, 8(3): 1079-1085.
shu
Li Kaihua, Yan Naiqiang, Xu Yaling, Huang Yuan, Qu Zan, Liu Zhibiao. Method of selective removal of fluosilicic acid from used glass thinning solution[J]. Chinese Journal of Environmental Engineering, 2014, 8(3): 1079-1085.
Citation: Li Kaihua, Yan Naiqiang, Xu Yaling, Huang Yuan, Qu Zan, Liu Zhibiao. Method of selective removal of fluosilicic acid from used glass thinning solution[J]. Chinese Journal of Environmental Engineering, 2014, 8(3): 1079-1085.
shu

玻璃减薄蚀刻液中氟硅酸的选择性脱除方法

  • 1. 上海交通大学环境科学与工程学院, 上海 200240
  • 2. 杭州格林达化学公司, 杭州 311200
  • 收稿日期:  2012-10-18
基金项目:

摘要: 光电玻璃减薄蚀刻液中氟硅酸（H2SiF6）的累积，是导致蚀刻液无法连续使用而转化为废液的主要原因。尝试对蚀刻废液中氟硅酸进行选择性脱除工艺，探索刻蚀液循环利用的有效处理方法。鉴于氟硅酸的碱金属盐具有溶解度较低的特点，研究考察了利用钠盐或钾盐为沉淀剂，将废液中的H2SiF6以氟硅酸盐的形式沉淀去除，为实现蚀刻液的循环利用提供可能。结果表明，KCl相比NaCl对H2SiF6处理效果更好，但生成的K2SiF6的结晶颗粒过细，难以自然沉降，过滤效果较差；而Na2SiF6结晶沉降特性较好，且使用NaCl为沉淀剂具有价廉易得等特点，可作为氟硅酸的理想沉淀剂。H2SiF6去除率与碱金属盐H2SiF6摩尔计量比正相关，当摩尔计量比NaCl/H2SiF6=2，H2SiF6含量10%的模拟废液，其H2SiF6去除率可达到90%以上。

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